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Streptavidin (4nm) |
| Streptavidin (4nm) |
| PDMS lithography (7nm) |
| Polymer brushes (75 nm) |
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Nanometric patterns of DOPC (2nm thick) characterization: [SARFUS] as an alternative to [Fluorescence & AFM] |
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| Collaboration: M. HIRTZ, Institute for Nanotechnology (INT), KIT, Karlsruhe, Germany |
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|  | | High sensitivity (lateral resolution: 350nm & z sensitivity: 0.3 nm) |
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| Fast & easy quality control of the patterns |
| | | Observation in real-time without any labelling & large field of view | | | | |
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A pattern of 1,2-dioleoyl-sn-glycero-3-phosphocholine (DOPC) admixed with 1 mol% of Rhodamin dye is deposited on a standard Air Surf by Dip Pen Nanolithography (DPN) process.
Currently, the study of such pattern often needs the use of two techniques:
- Fluorescence microscopy: allows a quick control of the pattern quality (lateral size, shape, defects localization, ...) thanks to a large field of view
- Atomic Force Microscopy: allows the thickness measurement of the pattern
If a lateral resolution better than 350nm is not needed, then SARFUS is a good alternative to provide you with both parameters at the same time. Contrary to Fluorescence Microscopy, SARFUS is able to quickly control even non-labelled sample. And compare to AFM, SARFUS is able to follow dynamic events in 3D at the nanometer scale (for example, the spreading of DOPC patterns).
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![Nanometric patterns of DOPC (2nm thick) characterization: [SARFUS] as an alternative to [Fluorescence & AFM]](userfiles/Image/application/GD_1288102766_2010_10_26.jpg)
